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DE400CHL E-beam Evaporation System
DE400CHL Electron Beam Evaporation System is assembled with one e-beam source of multiple crucible for deposition metals, semiconductor, insulation materials on the up to 6 inch substrate, and it is assembled with worldwide well known components, the configuration / specification as per following description:
Configuration
Evaporation Chamber
304 stainless steel chamber with viewport
Vacuum Pumping
Oxford cryo pump of 10" OD CF flange
1500L/s pumping speed
The base vacuum pressure of chamber：better than 7E-9Torr (clean, dry and empty condition)
Vacuum Valve
VAT High vacuum Gate valve, stainless steel, pneumatic actuation, 10”OD CF flange
Chamber rough pumping valve, stainless steel, high vacuum, pneumatic actuation
Stainless steel bellow/hose connection
Swagelok Pneumatic actuation valve for chamber vent
Evaporation Source
HCR series rotary EIGHT (8) pocket E-BEAM source with 7cc crucibles
Optional Load Lock chamber
304 stainless steel chamber with viewport
Sample Stage
Top mount and rotary or Side mount polar Substrate
Film Control
Crystal Film thickness Monitor and Control
Vacuum Gauging
Wide range vacuum gauge and rough gauge
Specification
The Base Vacuum Pressure
better than 7E-9Torr (clean, dry and empty condition)
Sample Loading Capacity
One Max. 8 inch flat substrate or multi small substrate
Rate Resolution
0.01 Angstroms/sec
Thickness Resolution = 0.02 Angstroms
0.1 Angstroms
