DE300 Thermal Evaporation System

LOAD LOCK Chamber (option)

Chamber with front open door

Cryopump and dry pump

Multiple thermal evaporation sources or OLED sources

Max. 6” substrate

Substrate rotation

Substrate bias (option)

Ion source for substrate cleaning (option)

Substrate heating to 1832°F (option)

Crystal rate monitor and film thickness control

Manual or automatic system control

For deposition of metal, semiconductor and insulation materials

For deposition of multi-layer or alloy film