Unique Design of Substrate Chamber and Sources chamber isolated by UHV gate valve
All Metal Seal, True UHV System
Stand along system frameworks and electric rack
E-beam source Water Interlock
Optional Substrate Cooling
The DE500CH Electron Beam Evaporator is assembled with two e-beam sources, the substrate is mounting on the horizontal axial on the side of chamber for the substrate polar to change the deposition angle.
Configuration
Evaporation Chamber | 304 stainless steel chamber with viewport |
Vacuum Pumping | Cryo-pump or Turbo pump and dry rough pump |
Vacuum Valve | Pneumatic UHV valves |
Evaporation Source |
One rotary six pocket E-BEAM source with 15cc crucibles One one pocket E-BEAM source with 15cc crucibles |
Substrate Chamber | 304 stainless steel chamber with viewport |
Sample Stage |
Top mounted rotary sample stage Side mounted tilt and rotary sample stage (option heating to 600C) (option cooling to -150C) |
Film Control | Crystal Film thickness Monitor and Control |
Vacuum Gauging | Wide range vacuum gauge and rough gauge |
| Load Lock Chamber (Option) | 304 stainless steel chamber of front open door with viewport |
SpecificationThe Base Vacuum Pressure | Better than 9E-8 Torr |
Sample Loading Capacity | One Max. 4 inch flat substrate |
Rate Resolution | 0.05 Angstroms/sec |
Thickness Resolution = 0.02 Angstroms
| 0.02 Angstroms |
Typical Application
For R & D Thin Film Deposition
Ideal tools for LIFT-OFF process
Evaporate metal, Semiconductor or Insulation Materials
Evaporate Magnetic Materials
