DE350 SiO2 Magnetron Sputtering System - DE Technology

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DE350 SiO2 Magnetron Sputtering System

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- Features
- Description
Chamber with front open door
Cryopump and dry pump
One 6” sputter source
RF power supply
Side sputter
Max. 6” substrate
Substrate water cooled
PID sputter pressure control
Manual or automatic system control
High sputter rate for SiO2
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